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ISSN 2072-3172


A.S. Metel, Yu.A. Melnik, P.S. Krasnov, H.A. Nay

Improvement of the magnetron sputtered coating adhesion due to application to the substrate of high-voltage pulses

Deposition of magnetron sputtered titanium nitride coatings has been studied a negative voltage of 100 V or pulses with amplitude up to 25 kV being applied to the substrates. In the latter case adhesion is much better due to mixing of the substrate and coating atoms by high-energy ions.

Keywords: magnetron sputtering, metal atoms, coating synthesis, high-energy ions, substrate, atoms mixing, adhesion.

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