V.P. Bolbukov

Sputtering targets at the bottom of the hollow cathode source quick atom gas in non uniform magnetic field

Dependence of a target sputtering rate distribution on configuration of the magnetic field near its surface and on the voltage between the target and a hollow cathode of a fast argon atom source has been investigated the target being placed on the bottom of the hollow cathode.


Keywords: target, sputtering, vapor, glow discharge, deposition, fast atoms..

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